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Main Camp

Entekno Materials, founded in 2008, develops sustainable UV protection and pigment solutions through its MicNo® Technology platform for cosmetic applications.

Presentation of Main Camp

Entekno Materials, founded in 2008 and operating from its R&D facilities in Turkey, develops sustainable UV protection and pigment solutions. The company’s portfolio includes:

  • MicNo® Pigment Series for enhanced product performance
  • Broad-spectrum UV protection technology
  • Sustainable ingredients for cosmetic formulations
  • Specialized particle technology for sunscreen applications

Through its MicNo® Technology platform, Entekno provides high-value ingredients that enable formulators to create effective sunscreen and cosmetic products while maintaining environmental responsibility.

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Detailed presentation of Main Camp

Entekno Materials: Innovation in cosmetic ingredients since 2008

Entekno Materials operates as a specialized cosmetic lab based in Turkey, focusing on the development of sustainable beauty and skincare ingredients. Founded in 2008, the company has established itself as a pioneer in UV protection technology within the cosmetic industry.

Advanced research and development capabilities

From their facility in Eskisehir, Turkey, Entekno Materials conducts extensive research to create innovative solutions for the cosmetic industry. Their flagship development, the MicNo® Particle Technology, addresses specific challenges faced by sunscreen and cosmetic formulators.

Key technological offerings

  • MicNo® Pigment Series for enhanced product performance
  • Broad-spectrum UV protection solutions
  • Transparent formulation options
  • High-value ingredients with low inclusion requirements

Environmental commitment and sustainable practices

Located in the industrial zone of Odunpazari, Eskisehir, Entekno’s research facility implements environmentally conscious practices in their development process. Their work focuses on creating products that combine performance with sustainability.

Sustainability initiatives

  • Plastic waste reduction programs
  • Development of eco-friendly formulations
  • Sustainable ingredient sourcing

Strategic location and market reach

Operating from their facility at 75.Yil O.S.B Mahallesi, Bilim Cad. in Eskisehir, Entekno Materials serves the growing Turkish cosmetic manufacturing sector while maintaining connections with international markets. The location in central Turkey provides strategic advantages for distribution across Europe and Asia.

Services provided by Main Camp

Below you will find the services provided by Entekno. Like each cosmetic lab on the platform, the services are manually registered by the providing company.

  • Entekno has no service catalogue on cosmetic-labs.com.

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Frequent questions

Entekno Materials provides the following products and services:

  • MicNo® Technology Solutions:
    • Pigment series for cosmetic applications
    • UV protection ingredients
    • Transparent formulation solutions
  • Product Development:
    • High-value cosmetic ingredients
    • Low inclusion level formulations
    • Sunscreen formulation components

The company has operated in the cosmetic ingredients sector since 2008.

Entekno Materials provides the following products and services:

  • MicNo® Technology Solutions:
    • Pigment series for cosmetic applications
    • UV protection ingredients
    • Transparent formulation solutions
  • Product Development:
    • High-value cosmetic ingredients
    • Low inclusion level formulations
    • Sunscreen formulation components

The company has operated in the cosmetic ingredients sector since 2008.

Entekno Materials provides the following products and services:

  • MicNo® Technology Solutions:
    • Pigment series for cosmetic applications
    • UV protection ingredients
    • Transparent formulation solutions
  • Product Development:
    • High-value cosmetic ingredients
    • Low inclusion level formulations
    • Sunscreen formulation components

The company has operated in the cosmetic ingredients sector since 2008.

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